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Plasmon‐enhanced polarized Raman spectroscopy for sensitive surface characterization
Author(s) -
Kasim J.,
Tee X. Y.,
You Y. M.,
Ni Z. H.,
Setiawan Y.,
Lee P. S.,
Chan L.,
Shen Z. X.
Publication year - 2008
Publication title -
journal of raman spectroscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.748
H-Index - 110
eISSN - 1097-4555
pISSN - 0377-0486
DOI - 10.1002/jrs.1999
Subject(s) - raman spectroscopy , surface enhanced raman spectroscopy , signal (programming language) , materials science , surface plasmon , layer (electronics) , plasmon , optoelectronics , characterization (materials science) , raman scattering , thin film , coating , optics , nanotechnology , computer science , physics , programming language
Local‐mode and localized surface plasmons generated on the silver thin film can selectively enhance the Raman signal from the surface. Further improvement of surface signal can be obtained by using the polarized Raman technique that results in a dramatic enhancement of the surface sensitivity by up to 25.4 times as compared to that without a silver coating. This technique will be very useful for Raman study on samples that suffer overlapping background signal. In this article, we show that it can be used to significantly improve the signal of thin strained‐Si layer on top of SiGe buffer layer. Copyright © 2008 John Wiley & Sons, Ltd.

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