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Process analysis of electroless nickel deposition baths by Raman spectroscopy
Author(s) -
Gantner E.,
Beck M.,
Müller H. G.,
Steinert D.,
Ache H. J.
Publication year - 1994
Publication title -
journal of raman spectroscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.748
H-Index - 110
eISSN - 1097-4555
pISSN - 0377-0486
DOI - 10.1002/jrs.1250250106
Subject(s) - hypophosphite , raman spectroscopy , nickel , plating (geology) , electroless nickel plating , aqueous solution , stoichiometry , analytical chemistry (journal) , spectrometer , inorganic chemistry , fourier transform infrared spectroscopy , materials science , deposition (geology) , chemistry , nuclear chemistry , metallurgy , electroless plating , chemical engineering , chromatography , nanotechnology , optics , geophysics , electroplating , engineering , biology , paleontology , layer (electronics) , physics , sediment , geology
In a test experiment carried out in a small compact electroless plating facility, the concentrations of hypophosphite and phosphite in a nickel deposition bath of the Kanigen type were monitored on‐line with a dispersive Raman spectrometer. From the results, which agreed with off‐line Fourier transform (FT) IR data within ca . 10%, the molar amounts of nickel, hypophosphite and phosphite consumed and formed were calculated and compared with the stoichiometry of the nickel plating process adopted. In addition, nickel bath samples were also measured with an FT Raman spectrometer to compare the performances of both Raman techniques with a view to their application to aqueous solutions.