In situ  Raman monitoring of the growth of CVD diamond films | Zendy

Mermoux M. | Zendy; Marcus B. | Zendy; Abello L. | Zendy; Rosman N. | Zendy; Lucazeau G. | Zendy

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In situ Raman monitoring of the growth of CVD diamond films

Author(s) -

Mermoux M.,

Marcus B.,

Abello L.,

Rosman N.,

Lucazeau G.

Publication year - 2003

Publication title -

journal of raman spectroscopy

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.748

H-Index - 110

eISSN - 1097-4555

pISSN - 0377-0486

DOI - 10.1002/jrs.1012

Subject(s) - raman spectroscopy , diamond , chemical vapor deposition , substrate (aquarium) , synthetic diamond , analytical chemistry (journal) , plasma , carbon film , materials science , chemistry , nanotechnology , thin film , optics , composite material , environmental chemistry , geology , oceanography , physics , quantum mechanics

Raman spectroscopy was applied to monitor the growth of diamond in different plasma‐assisted chemical vapour deposition reactors. A gated, multichannel detection system was used to discriminate against the high level of background radiation produced by the plasma and the hot substrate. As a result, Raman spectra could be taken during diamond growth without interruption of the process. The ability to detect and distinguish between diamond and non‐diamond phases during film growth is demonstrated. A sufficient signal‐to‐noise ratio in the spectra was achieved for stress formation to be observed. Copyright © 2003 John Wiley & Sons, Ltd.

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