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In situ Raman monitoring of the growth of CVD diamond films
Author(s) -
Mermoux M.,
Marcus B.,
Abello L.,
Rosman N.,
Lucazeau G.
Publication year - 2003
Publication title -
journal of raman spectroscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.748
H-Index - 110
eISSN - 1097-4555
pISSN - 0377-0486
DOI - 10.1002/jrs.1012
Subject(s) - raman spectroscopy , diamond , chemical vapor deposition , substrate (aquarium) , synthetic diamond , analytical chemistry (journal) , plasma , carbon film , materials science , chemistry , nanotechnology , thin film , optics , composite material , environmental chemistry , geology , oceanography , physics , quantum mechanics
Raman spectroscopy was applied to monitor the growth of diamond in different plasma‐assisted chemical vapour deposition reactors. A gated, multichannel detection system was used to discriminate against the high level of background radiation produced by the plasma and the hot substrate. As a result, Raman spectra could be taken during diamond growth without interruption of the process. The ability to detect and distinguish between diamond and non‐diamond phases during film growth is demonstrated. A sufficient signal‐to‐noise ratio in the spectra was achieved for stress formation to be observed. Copyright © 2003 John Wiley & Sons, Ltd.