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Gas‐phase ion chemistry in XH 4 C 3 H 4 ZH 3 (XSi, Ge; ZN, P) mixtures
Author(s) -
Operti Lorenza,
Rabezzana Roberto,
Turco Francesca,
Vaglio Gian Angelo
Publication year - 2005
Publication title -
journal of mass spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.475
H-Index - 121
eISSN - 1096-9888
pISSN - 1076-5174
DOI - 10.1002/jms.825
Subject(s) - chemistry , germane , propyne , reactivity (psychology) , phosphine , silane , ion , molecule , ion trap , mass spectrometry , germanium , ammonia , allene , analytical chemistry (journal) , inorganic chemistry , silicon , photochemistry , organic chemistry , medicine , alternative medicine , pathology , chromatography , catalysis
The gas‐phase ion chemistry of silane–allene–ammonia, germane–allene (or propyne)–ammonia (or phosphine) systems was studied by ion trap mass spectrometry. Reaction sequences were determined and rate constants were measured for the main processes observed. The mixture containing silane displays higher reactivity with respect to that with germane. Comparison with analogous systems provides useful information about the reactivity of different hydrocarbon molecules and the different affinities of silicon and germanium towards nitrogen and phosphorus. The most interesting product ions observed are those containing Si (or Ge), C and N (or P) elements together, as these ion species may be considered precursors of doped amorphous carbides, which are widely used in semiconductor devices. Copyright © 2005 John Wiley & Sons, Ltd.