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Metastable ion study of organosilicon compounds. Part XIV —trimethylsilylacetic acid, (CH 3 ) 3 SiCH 2 COOH, and its methyl ester, (CH 3 ) 3 SiCH 2 COOCH 3
Author(s) -
Tajima Susumu,
Watanabe Daisuke,
Nakajima Satoshi,
Sekiguchi Osamu,
Nibbering Nico M. M.
Publication year - 2002
Publication title -
journal of mass spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.475
H-Index - 121
eISSN - 1096-9888
pISSN - 1076-5174
DOI - 10.1002/jms.284
Subject(s) - chemistry , organosilicon , ion , electron ionization , metastability , mass spectrometry , polyatomic ion , methyl radical , abundance (ecology) , ionization , mass spectrum , medicinal chemistry , chemical ionization , decomposition , analytical chemistry (journal) , organic chemistry , radical , chromatography , fishery , biology
The unimolecular metastable decompositions of trimethylsilylacetic acid, (CH 3 ) 3 SiCH 2 COOH ( 1 ), and its methyl ester, (CH 3 ) 3 SiCH 2 COOCH 3 ( 2 ), were investigated by mass‐analyzed ion kinetic energy (MIKE) spectrometry in conjunction with thermochemical data. The abundance of the molecular ions of both compounds, generated by electron ionization, is extremely low. However, the abundance of the ions generated by the loss of . CH 3 and observed at m / z 117 and 131 is moderate. These fragment ions further decompose to form the most abundant m / z 75 and 89 ions, respectively, by the loss of CH 2 CO through a (CH 3 ) 2 Si group migration. The loss of CH 2 CO is also observed to occur from 2 + . and its fragment ion at m / z 115 generated by the loss of . OCH 3 . The former reaction is proposed to occur via an ion–radical complex. Copyright © 2002 John Wiley & Sons, Ltd.