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MRT Letter: Two‐photon excitation‐based 2pi Light‐sheet system for nano‐lithography
Author(s) -
Mohan Kavya,
Mondal Partha Pratim
Publication year - 2015
Publication title -
microscopy research and technique
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.536
H-Index - 118
eISSN - 1097-0029
pISSN - 1059-910X
DOI - 10.1002/jemt.22452
Subject(s) - lithography , nano , optics , plasmon , superposition principle , excitation , physics , nanometre , photon , lens (geology) , optoelectronics , materials science , nanotechnology , quantum mechanics
We propose two‐photon excitation‐based light‐sheet technique for nano‐lithography. The system consists of 2 π ‐configured cylindrical lens system with a common geometrical focus. Upon superposition, the phase‐matched counter‐propagating light‐sheets result in the generation of identical and equi spaced nano‐bump pattern. Study shows a feature size of as small as few tens of nanometers with a inter‐bump distance of few hundred nanometers. This technique overcomes some of the limitations of existing nano‐lithography techniques, thereby, may pave the way for mass‐production of nano‐structures. Potential applications can also be found in optical microscopy, plasmonics, and nano‐electronics. Microsc. Res. Tech. 78:1–7, 2015 . © 2014 Wiley Periodicals, Inc.