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MRT Letter: High resolution SEM imaging of nano‐architecture of cured urea‐formaldehyde resin using plasma coating of osmium
Author(s) -
Park ByungDae,
Singh Adya P.,
Nuryawan Arif,
Hwang Kiju
Publication year - 2013
Publication title -
microscopy research and technique
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.536
H-Index - 118
eISSN - 1097-0029
pISSN - 1059-910X
DOI - 10.1002/jemt.22272
Subject(s) - osmium , coating , materials science , urea formaldehyde , scanning electron microscope , nano , formaldehyde , chemical engineering , nuclear chemistry , composite material , chemistry , organic chemistry , ruthenium , catalysis , adhesive , layer (electronics) , engineering
Nanoarchitecture of cured urea‐formaldehyde (UF) resins was examined with a field‐emission scanning electron microscope (FE‐SEM) after coating samples with osmium, which is considered to produce particles of considerably smaller size compared to other metal coatings used in SEM studies. This method enabled comparison of the nanoarchitecture of UF resins of low (1.0) and high (1.6) formaldehyde/urea (F/U) mole ratios to be made, based on imaging of extremely small size particles as part of UF resin architecture, not described before. Imaging revealed presence of relatively large globular particles (148.084–703.983 nm size range) as well as smaller substructures (28.004–39.604 nm size range) as part of the architecture of 1.0‐mole UF resin. Globular particles were also present in 1.6 mole UF resin, but of considerably smaller size (14.760–50.269 nm). The work presented demonstrates usefulness of osmium coating in unraveling the intricacies of the nanostructural organization of cured UF resins, prompting wider application of this immensely useful but grossly underutilized metal coating type in high resolution SEM examination of biological and materials samples. Microsc. Res. Tech. 76:1108–1111, 2013 . © 2013 Wiley Periodicals, Inc.