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Nanoprofiles evaluation of ZnO thin films by an evanescent light method
Author(s) -
Mirchin Nina,
Peled Aaron,
Duta Liviu,
Popescu Andrei C.,
Dorcioman Gabriela,
Mihailescu Ion N.
Publication year - 2013
Publication title -
microscopy research and technique
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.536
H-Index - 118
eISSN - 1097-0029
pISSN - 1059-910X
DOI - 10.1002/jemt.22259
Subject(s) - thin film , materials science , optics , optoelectronics , zinc , evanescent wave , nanotechnology , physics , metallurgy
The extraction efficiency of evanescent light from ZnO nanolayers and their thickness profiles in the range of (1–105) nm was evaluated by a new microscopy technique, differential evanescent light intensity imaging method. It is based on capturing the evanescent light scattered by the layer of the material deposited on glass substrates. The analyzed ZnO films were obtained by pulsed laser deposition at 27°C and 100°C, using a nanosecond UV laser source. Microsc. Res. Tech., 76:992–996, 2013 . © 2013 Wiley Periodicals, Inc.