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Cross‐section metal sample preparations for transmission electron microscopy by electro‐deposition and electropolishing
Author(s) -
Niu Rongmei,
Han Ke
Publication year - 2013
Publication title -
microscopy research and technique
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.536
H-Index - 118
eISSN - 1097-0029
pISSN - 1059-910X
DOI - 10.1002/jemt.22189
Subject(s) - electropolishing , polishing , transmission electron microscopy , materials science , focused ion beam , sample preparation , copper , deposition (geology) , ion milling machine , electron beam induced deposition , perforation , analytical chemistry (journal) , metallurgy , nanotechnology , ion , chemistry , scanning transmission electron microscopy , electrode , chromatography , paleontology , punching , organic chemistry , layer (electronics) , sediment , biology , electrolyte
A cross‐section sample preparation technique is described for transmission electron microscopy studies of metallic materials. The technique uses jet electro‐polishing for the final perforation. Examples are provided of using this technique for copper‐support/copper‐films/copper‐support multilayer structures, grown by electro‐deposition. The samples prepared by our current technique are compared with the ones made by ion‐milling. The technique is also applicable to materials which are susceptible to ion beam and thermal damages. Microsc. Res. Tech. 76:476–480, 2013 . © 2013 Wiley Periodicals, Inc.