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Influence of atomic force microscopy acquisition parameters on thin film roughness analysis
Author(s) -
Hristu Radu,
Stanciu Stefan G.,
Stanciu George A.,
Çapan İnci,
Güner Burcu,
Erdoğan Matem
Publication year - 2012
Publication title -
microscopy research and technique
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.536
H-Index - 118
eISSN - 1097-0029
pISSN - 1059-910X
DOI - 10.1002/jemt.22014
Subject(s) - atomic force microscopy , surface roughness , root mean square , surface finish , materials science , fabrication , thin film , microscopy , optics , nanotechnology , composite material , physics , medicine , alternative medicine , pathology , quantum mechanics
A reliable procedure for measuring parameters connected to surface roughness is needed to compare the gas sensing properties of various thin films or the effect of different fabrication procedures on the surface roughness and the sensing properties. In this article, we propose to investigate how the acquisition parameters specific to atomic force microscopy investigations such as pixel size, scan area and scan speed influence the roughness parameters, namely root mean square and surface area ratio, commonly used for characterizing the gas sensing properties of porphyrins and other materials. Microsc. Res. Tech. 2012. © 2012 Wiley Periodicals, Inc.