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Reducing the formation of FIB‐induced FCC layers on Cu‐Zn‐Al austenite
Author(s) -
Zelaya Eugenia,
Schryvers Dominique
Publication year - 2011
Publication title -
microscopy research and technique
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.536
H-Index - 118
eISSN - 1097-0029
pISSN - 1059-910X
DOI - 10.1002/jemt.20877
Subject(s) - materials science , electropolishing , ion , precipitation , irradiation , austenite , focused ion beam , alloy , ion milling machine , ion beam , analytical chemistry (journal) , metallurgy , nanotechnology , layer (electronics) , chemistry , microstructure , physics , organic chemistry , electrode , chromatography , meteorology , nuclear physics , electrolyte
The irradiation effects of thinning a sample of a Cu‐Zn‐Al shape memory alloy to electron transparency by a Ga + focused ion beam were investigated. This thinning method was compared with conventional electropolishing and Ar + ion milling. No implanted Ga was detected but surface FCC precipitation was found as a result of the focused ion beam sample preparation. Decreasing the irradiation dose by lowering the energy and current of the Ga + ions did not lead to a complete disappearance of the FCC structure. The latter could only be removed after gentle Ar + ion milling of the sample. It was further concluded that the precipitation of the FCC is independent of the crystallographic orientation of the surface. Microsc. Res. Tech. 74:84‐91, 2011. © 2010 Wiley‐Liss, Inc.