In situ SEM indentation experiments: Instruments, methodology, and applications | Zendy

Ghisleni Rudy | Zendy; RzepiejewskaMalyska Karolina | Zendy; Philippe Laetitia | Zendy; Schwaller Patrick | Zendy; Michler Johann | Zendy

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In situ SEM indentation experiments: Instruments, methodology, and applications

Author(s) -

Ghisleni Rudy,

RzepiejewskaMalyska Karolina,

Philippe Laetitia,

Schwaller Patrick,

Michler Johann

Publication year - 2009

Publication title -

microscopy research and technique

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.536

H-Index - 118

eISSN - 1097-0029

pISSN - 1059-910X

DOI - 10.1002/jemt.20677

Subject(s) - indentation , scanning electron microscope , materials science , in situ , nanoindentation , microelectromechanical systems , nanoelectromechanical systems , nanotechnology , nanowire , composite material , chemistry , nanoparticle , nanomedicine , organic chemistry

The purpose of this article is to present the design and capabilities of two in situ scanning electron microscope (SEM) indentation instruments covering a large load range from μN to N. The capabilities and advantages of in situ SEM indentation are illustrated by two applications: indentation of a thin film and a nanowire. All the experiments were performed on electrodeposited cobalt, whose outstanding magnetic properties make it a candidate material for MEMS and NEMS devices. Microsc. Res. Tech., 2009. © 2009 Wiley‐Liss, Inc.

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