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Self‐organized nanotemplating on misfit dislocation networks investigated by scanning tunneling microscopy
Author(s) -
Diaconescu Bogdan,
Nenchev Georgi,
Jones Joshua,
Pohl Karsten
Publication year - 2007
Publication title -
microscopy research and technique
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.536
H-Index - 118
eISSN - 1097-0029
pISSN - 1059-910X
DOI - 10.1002/jemt.20479
Subject(s) - scanning tunneling microscope , nucleation , materials science , dislocation , substrate (aquarium) , nanotechnology , thin film , chemical physics , quantum tunnelling , length scale , self assembly , condensed matter physics , optoelectronics , chemistry , composite material , oceanography , physics , organic chemistry , quantum mechanics , geology
Self‐ordering growth of nanoarrays on strained metallic interfaces is an attractive option for preparing highly ordered nanotemplates. The great potential of this natural templating approach is that symmetry, feature sizes, and density are predicted to depend on the interfacial stress in these strained layers, which can be adjusted by changing the substrate‐thin film composition, temperature, and adlayer coverage. This bottom‐up approach of growing nanostructured two‐dimensional ordered arrays of clusters on the misfit dislocation networks of strained metallic thin films and surfaces requires a detailed understanding of the nucleation and film–adsorbate interaction processes. Here we show how high resolution, large scale, variable temperature scanning tunneling microscopy imaging can improve our understanding of these self‐assembly processes. Microsc. Res. Tech., 2007. © 2007 Wiley‐Liss, Inc.