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The Protection of Flexible DSSC Polymeric Substrate using Atmospheric Pressure Plasma Coating
Author(s) -
Huang Chun,
Wu ShinYi,
Chang YaChi,
Pan ChienHsuan,
Tsai ChingYuan
Publication year - 2010
Publication title -
journal of the chinese chemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.329
H-Index - 45
eISSN - 2192-6549
pISSN - 0009-4536
DOI - 10.1002/jccs.201000177
Subject(s) - chemistry , coating , fourier transform infrared spectroscopy , atmospheric pressure plasma , analytical chemistry (journal) , substrate (aquarium) , argon , volumetric flow rate , chemical engineering , plasma , chromatography , organic chemistry , physics , oceanography , quantum mechanics , engineering , geology
Protective SiOx coating on polymeric substrates were deposited at room temperature by atmospheric pressure plasma jet (APPJ), using HMDSO (Hexamethylsiloxane) as monomer and argon (Ar) as carrier gas, have been investigated for the surface properties as a function of plasma operational parameters including in RF plasma power, substrate temperature, and monomer flow rate. The improved hardness of direct APPJ deposited polymeric substrates have been determined by pencil test and related to the chemical composition and to the surface morphology of the plasma coated SiOx layers. The direct APPJ deposited films have been analyzed by Fourier transform infrared spectroscopy (FTIR), UV‐vis spectrometer, and AFM (Atomic Forced Microscopy). From FT‐IR analysis, it resulted that remote APPJ deposited films become more inorganic as the monomer flow rate increased. UV‐vis spectra, detected in the range of 300‐800 nm, examined the improved transparency in the visible and increased absorption in UV region. Protective SiOx coating has a potential application in dye‐sensitized‐solar‐cells.