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Reactions of Difluorosilylene with Amines, Phosphines and Halomethanes The First Evidence of the Insertion of Difluorosilylene into Tetrafluorosilane
Author(s) -
Chang ChihWei,
Liu ChaoShiuan,
Lee ChiYoung
Publication year - 1999
Publication title -
journal of the chinese chemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.329
H-Index - 45
eISSN - 2192-6549
pISSN - 0009-4536
DOI - 10.1002/jccs.199900061
Subject(s) - chemistry , base (topology) , lewis acids and bases , medicinal chemistry , stereochemistry , organic chemistry , catalysis , mathematical analysis , mathematics
The reactions of SiF 2 /SiF 4 with amines, phosphines and various halomethanes were studied. The results show that in the presence of strong Lewis base (Et 3 N, HNEt 2 , PR 3 , PR 2 Cl), SiF 2 inserts initially into SiF 4 to form Si 2 F 6 , which was followed by subsequent reactions leading to products containing SiF 3 groups. This is the first report of the insertion of SiF 2 into SiF 4 . When the reactants were a weaker base (such as RPCl 2 , CX 3 Br, X=F, Cl), insertion of SiF 2 into P‐Cl and C‐Br bonds became predominant.