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Chemical Bonding State of Chlorine on Ag{100} as Determined by Angle‐Resolved Secondary Ion Mass Spectrometry
Author(s) -
Chang CheChen,
Lung ChienHua
Publication year - 1996
Publication title -
journal of the chinese chemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.329
H-Index - 45
eISSN - 2192-6549
pISSN - 0009-4536
DOI - 10.1002/jccs.199600022
Subject(s) - chemistry , chlorine , mass spectrometry , ion , secondary ion mass spectrometry , analytical chemistry (journal) , chromatography , organic chemistry
The power of the angle‐resolved ion desorption technique for straightforward characterization of surfaces is demonstrated. The structural sensitivity of secondary ion desorption has led to a successful application of angle‐resolved ion sputtering yield measurements to the determination of the Cl chemical bonding structure on the Ag {100} surface. Angular distributions of the sputtered Cl − ions show that chlorine dissociates at the surface to yield a bonding state of atomic form at the room temperature. Both the polar and the azimuthal angle dependencies of the sputter intensity for Ag + and Cl − ions reveal that the Cl adatom is chemi‐sorbed high above the topmost substrate layer of Ag atoms. At all Cl exposures, the Ag‐Cl bond is oriented along the <100> azimuth with the adsorbate occupying a C 4 symmetry site, not an a‐top, a bridge, or a high symmetry site. Shadow‐cone enhanced ion desorption spectra show that die geometrical structure of the Cl chemisorbed surface changes slightly as the exposure is increased.