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Diffusion Coefficients of Atomic Halogen
Author(s) -
Hwang MingDar,
Su TzuMin
Publication year - 1990
Publication title -
journal of the chinese chemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.329
H-Index - 45
eISSN - 2192-6549
pISSN - 0009-4536
DOI - 10.1002/jccs.199000005
Subject(s) - noble gas , chemistry , halogen , diffusion , noble metal , inert gas , atom (system on chip) , chlorine , inert , atomic physics , thermodynamics , organic chemistry , metal , alkyl , physics , computer science , embedded system
Diffusion coefficients of atomic halogen with noble gases were calculated from the potential curves reported in the literature from the crossed molecular‐beam scattering experiments. The deviations of the diffusion constants between the atomic halogen‐noble gas systems and the neighboring noble gas‐noble gas systems were obtained over the temperature range of 200 K to 1100 K. The parameters of Lennard‐Jones 6–12 potentials were also obtained for the chlorine and iodine atoms. The internal consistency of the diffusion constants calculated from the 6–12 potential parameters among the halogen atom‐noble gas systems is very good. However, the agreement was found to be only fair for the inert molecular systems with the chlorine atoms. The extent of the similarity of the diffusion constants between the atomic halogen‐noble gas and the noble gas‐noble gas systems is discussed.