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Current Developments in Optical Emission Spectrometry with High‐Frequency and Microwave Induced Plasmas
Author(s) -
Broekaert J.A.C.
Publication year - 1990
Publication title -
journal of the chinese chemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.329
H-Index - 45
eISSN - 2192-6549
pISSN - 0009-4536
DOI - 10.1002/jccs.199000001
Subject(s) - chemistry , plasma , slurry , inductively coupled plasma , microwave , analytical chemistry (journal) , evaporation , mass spectrometry , characterization (materials science) , electric arc , inductively coupled plasma mass spectrometry , inductively coupled plasma atomic emission spectroscopy , nanotechnology , electrode , chromatography , materials science , physics , quantum mechanics , composite material , thermodynamics
The state‐of‐the‐art and trends of development with the inductively coupled plasma (ICP) and microwave induced plasmas (MIP) as radiation sources for optical emission spectrometry arc presented. Especially techniques for sample introduction are discussed. Here special reference is given to the use of spark ablation as well as 10 direct sample insertion and slurry atomization for the direct analysis of powder samples. The development in MIP optical emission Spectrometry is shown to center on the improvement of the plasma sources, their characterization and their tailoring to various sampling techniques. Results of the use of pneumatic nebulization of liquids and electrothermal evaporation of dry solution residues will be presented.