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A Study of the Nitroso Spin Adducts of the Pentacarbonyl Rhenium Radical
Author(s) -
Chen H. S.,
Chen C. P.
Publication year - 1984
Publication title -
journal of the chinese chemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.329
H-Index - 45
eISSN - 2192-6549
pISSN - 0009-4536
DOI - 10.1002/jccs.198400045
Subject(s) - chemistry , nitrosobenzene , adduct , nitroxide mediated radical polymerization , rhenium , photochemistry , methylene , solvent , electron paramagnetic resonance , radical , nitroso , nitroxyl , hyperfine structure , inorganic chemistry , medicinal chemistry , organic chemistry , nuclear magnetic resonance , copolymer , catalysis , polymer , physics , radical polymerization , quantum mechanics
Nitrosobenzene (NB) and nitroso‐ tetr ‐butane (NtB) were used to trap the photogenerated rhenium pentacarbonyl radical. Self trapped radicals and spin adducts were studied in detail by EPR spectroscopy. In methylene chloride, both nitroxide and anilino spin adducts can be observed with NtB at −30°. In contrast, only the nitroxide spin adduct of nitrosobenzene was observed in either hexane, or methylene chloride solution. This solvent controlled spin adduct chemistry, can be explained in terms of the solute‐solvent interaction.