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Surface topography of zirconia implants does not alter action potentials of isolated rat sciatic nerves
Author(s) -
Ertan Ahmet Atila,
Çelebi Nilüfer,
Bayolken Merve,
Onur Mehmet Ali,
Aboushelib Moustafa Nabil,
Feilzer Albert,
Cehreli Murat
Publication year - 2009
Publication title -
journal of biomedical materials research part b: applied biomaterials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.665
H-Index - 108
eISSN - 1552-4981
pISSN - 1552-4973
DOI - 10.1002/jbm.b.31166
Subject(s) - materials science , implant , cubic zirconia , sciatic nerve , compound muscle action potential , biomedical engineering , anatomy , composite material , electrophysiology , surgery , medicine , ceramic
The purpose of this study was to explore the effects of airborne‐particle abrasion and selective infiltration etching of a yttrium‐partially stabilized tetragonal zirconia polycrystal (Y‐TZP) implant surfaces on nerve conduction. Particle‐abraded Y‐TZP (P/Y‐TZP), selective infiltration etched Y‐TZP (SIE/Y‐TZP), and commercially pure titanium (CP‐Ti) were used in the study ( n = 5).The compound action potentials of the right and left sciatic nerves of eight sacrificed rats were quantified at the in vitro level. The implants were brought into intimate contact with the nerves and the time required for initiation of compound action potentials (TcAP), depolarization (Dp), repolarization (Rp), and amplitude of evoked compound action potentials (cAPs) were recorded before and after contact with the implants. The difference in cAPs between the basal response and after contact with CP‐Ti implant was significant ( p < 0.05). Time‐dependent changes in cAPs of P/Y‐TZP and SIE/Y‐TZP groups and their basal nerve responses were similar ( p > 0.05). Within‐ and between‐subject comparisons revealed that TcAP, Dp, and Rp values for all groups were similar ( p > 0.05). Particle‐abraded and selective infiltration‐etched zirconia implant surfaces do not alter nerve conduction beyond physiologic limits. © 2008 Wiley Periodicals, Inc. J Biomed Mater Res Part B: Appl Biomater, 2009