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Optimization of a RF‐generated CF 4 /O 2 gas plasma sterilization process
Author(s) -
Lassen Klaus S.,
Nordby Bolette,
Grün Reinar
Publication year - 2003
Publication title -
journal of biomedical materials research part b: applied biomaterials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.665
H-Index - 108
eISSN - 1552-4981
pISSN - 1552-4973
DOI - 10.1002/jbm.b.10004
Subject(s) - sterilization (economics) , rf power amplifier , plasma , spore , endospore , radio frequency , electrode , volumetric flow rate , materials science , analytical chemistry (journal) , chemistry , nuclear engineering , chromatography , optoelectronics , microbiology and biotechnology , electrical engineering , physics , biology , thermodynamics , cmos , monetary economics , foreign exchange market , amplifier , engineering , quantum mechanics , foreign exchange , economics
A sterilization process with the use of RF‐generated (13.56 MHz) CF 4 /O 2 gas plasma was optimized in regards to power, flow rate, exposure time, and RF‐system type. The dependency of the sporicidal effect on the spore inoculum positioning in the chamber of the RF systems was also investigated. Dried Bacillus stearothermophilus ATCC 7953 endospores were used as test organisms. The treatments were evaluated on the basis of survival curves and corresponding D values. The only parameter found to affect the sterilization process was the power of the RF system. Higher power resulted in higher kill. Finally, when the samples were placed more than 3–8 cm away from a centrally placed electrode in System 2, the sporicidal effect was reduced. The results are discussed and compared to results from the present literature. The RF excitation source is evaluated to be more appropriate for sterilization processes than the MW source. © 2003 Wiley Periodicals, Inc. J Biomed Mater Res Part B: Appl Biomater 65B: 239–244, 2003