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P‐113: Photoalignment Technology for High Performance IPS‐LCDs: IPS‐NEO Technology
Author(s) -
Kunimatsu Noboru,
Sonoda Hidehiro,
Hyodo Yosuke,
Tomioka Yasushi
Publication year - 2014
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/j.2168-0159.2014.tb00371.x
Subject(s) - rubbing , anchoring , azimuth , materials science , optoelectronics , liquid crystal display , optics , computer science , engineering , physics , composite material , structural engineering
We have developed our original photoalignment technology, IPS‐NEO, which improves azimuthal anchoring strength to a level equivalent to that of rubbing, and reduces photoirradiation energy to a level required for mass production. We have also clarified that the anchoring strength of IPS‐NEO does not depend on the unevenness of the surface of the substrates, nor does it depend on the bias angle between the alignment axis and the direction of the electrodes. With this technology, we realized practical application of photoalignment for high performance IPS‐LCDs.