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P‐65: Study on Resin as Passivation Layer of Retina Display for Mobile Phone Screen
Author(s) -
Yan Changjiang,
Xie Zhenyu,
Guo Jian,
Wang Wei,
Min TaeYup,
Su Shunkang,
Lu Kai,
Zhang Jiaxiang,
Li Tiansheng,
Xu Shaoying,
Zhang Wenyu,
Tian Zongmin,
Li Jing,
Kun Liu
Publication year - 2014
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/j.2168-0159.2014.tb00319.x
Subject(s) - passivation , materials science , layer (electronics) , dielectric , thin film transistor , optoelectronics , etching (microfabrication) , transparency (behavior) , mobile phone , liquid crystal display , composite material , computer science , telecommunications , computer security
The Si‐C resin layer has lower dielectric constant, better optical transparency, and can be spin coated as a flat surface film easily. By using Si‐C resin as passivation layer, we investigated the etching characteristics of resin thin films in SF6/O2/He plasma, and found the variable thickness of channel protection layers have a play role in a‐Si:H TFT characteristic. We also success in prototyping a high definition LCD panel, retina display as 326 pixels per inch, which can be improved the RC delay of signal effectively and decreased nearly 40% in the logic power consumption compare to the existing panel with only SiNx passivation layer.