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10.4: A Delamination Method and Ultra‐High‐Reliable Gas Barrier Film for Flexible OLED Displays
Author(s) -
Lin YuLing,
Ke TsungYing,
Liu ChanJui,
Huang ChenShuo,
Lin PoYang,
Tsai ChihHung,
Tu ChiaHsun,
Wang PinFang,
Lu HsuehHsing,
Lee MengTing,
Hwu KehLong,
Chuang ChingSang,
Lin YuHsin
Publication year - 2014
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/j.2168-0159.2014.tb00032.x
Subject(s) - delamination (geology) , amoled , oled , materials science , composite material , optoelectronics , substrate (aquarium) , fabrication , thin film transistor , layer (electronics) , medicine , paleontology , oceanography , tectonics , alternative medicine , pathology , active matrix , subduction , biology , geology
A highly reliable ultra‐high gas barrier (UGB) was developed and applied on the fabrication of 4.3‐inch flexible AMOLED. The water vapor transmission rate of the UGB on flexible substrate could achieve ∼ 10 −6 g/m 2 ‐day under a calcium test (60°C and 90%RH). In addition, a delamination method to remove the flexible AMOLED from the glass carrier was proposed where the mechanical strain during the delamination is controlled within 0.2%. With the incorporation of a metallic interlayer, the damage of TFT due to the electrostatic discharges from the delaminated surfaces can be prevented.