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6.4: Ultra‐High Gas Barrier Films Based on a Few Barrier Layer Stack Fabricated by a Wet Coating and a Plasma Assisted Surface Modification
Author(s) -
Suzuki Yuta,
Nishijima Kenta,
Naganawa Satoshi,
Nagamoto Koichi,
Kondo Takeshi
Publication year - 2014
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/j.2168-0159.2014.tb00016.x
Subject(s) - coating , barrier layer , materials science , stack (abstract data type) , layer (electronics) , plasma , surface modification , nanotechnology , chemical engineering , physics , quantum mechanics , computer science , engineering , programming language
We have developed ultra‐high gas barrier films fabricated by wet coating technologies of barrier‐precursor and plasma assisted surface modifications. Owing to efficient coverage of wet process, our gas barrier films achieved 10 −5 g·m −2 ·day −1 under 40 °C, 90%RH by only a few layer stack of the barrier layers.