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46.2: Invited Paper : Micron‐Patterned Deposition through Shadow masks with high precision alignment for OLED and e‐Paper applications
Author(s) -
Ambrose T.,
Tamura P.,
Brocato B.,
Bucci B.,
Conrad J.,
Shelapinsky J.,
Sharma P.,
Little S. Lauer and W.
Publication year - 2013
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/j.2168-0159.2013.tb06291.x
Subject(s) - shadow mask , shadow (psychology) , repeatability , computer science , oled , detector , deposition (geology) , optoelectronics , materials science , optics , artificial intelligence , computer vision , computer graphics (images) , nanotechnology , physics , telecommunications , chemistry , psychology , paleontology , chromatography , layer (electronics) , sediment , psychotherapist , biology
Conventional shadow‐mask alignment using mechanical pins or machine‐vision techniques achieve 5 micron alignment accuracy. Here we introduce a novel alignment system‐architecture based on coded apertures along with discrete photo detectors as the sensing elements. It allows submicron accuracy and repeatability making it highly suitable for display manufacturing applications.