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33.4L: Late‐News Paper : High Resolution Vacuum Patterning of Organic‐ and Metal‐Layers for Organic Electronic Devices
Author(s) -
Burghart Markus,
Dutkowiak Andreas,
Tandler Lutz,
Richter Jörk,
Haasemann Georg,
Gross Harald,
Seyfert Ulf,
Strietzel Thomas,
Hecht Christian
Publication year - 2013
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/j.2168-0159.2013.tb06238.x
Subject(s) - oled , amoled , lithography , materials science , pixel , nanotechnology , flash (photography) , high resolution , cluster (spacecraft) , optoelectronics , computer science , optics , physics , artificial intelligence , remote sensing , geology , thin film transistor , layer (electronics) , active matrix , programming language
In this paper, we describe the recent progress made in the development of the Flash Mask Transfer Lithography for AMOLED‐pixel patterning. Basic principles of the technology are discussed, recent results on resolution and processing are presented and patterns and materials were analyzed. Based on the technology a lab scale cluster‐tool was manufactured to demonstrate the feasibility of pixel patterning in OLED displays.