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29.2: Atomic Layer Deposition of Al 2 O 3 /ZrO 2 Nanolaminate on the Plastic Substrates for the Flexible Display
Author(s) -
Lee Jong Geol,
Kim Hyun Gi,
Kim Sung Soo
Publication year - 2013
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/j.2168-0159.2013.tb06220.x
Subject(s) - atomic layer deposition , materials science , layer (electronics) , deposition (geology) , chemical engineering , optoelectronics , nanotechnology , paleontology , sediment , engineering , biology
Al 2 O 3 /ZrO 2 nanolaminate was formed on plastic substrates by low frequency plasma‐enhanced atomic layer deposition (PEALD) process for enhancement of barrier properties. A remarkable barrier performance was observed in the optimized nanolaminate structure, which was attributed to cover the drawback of each layer between the Al 2 O 3 /ZrO 2 nanolaminate.