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An advanced oxidation process for DBP control
Author(s) -
Symons James M.,
Worley Kevin L.
Publication year - 1995
Publication title -
journal ‐ american water works association
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.466
H-Index - 74
eISSN - 1551-8833
pISSN - 0003-150X
DOI - 10.1002/j.1551-8833.1995.tb06452.x
Subject(s) - process (computing) , oxidation process , control (management) , process management , computer science , process engineering , business , chemical engineering , engineering , operating system , artificial intelligence
Potentially of use to small systems for disinfection by‐products control, a relatively simple advanced oxidation process was evaluated at bench scale. Small water utilities often have difficulty operating complicated treatment processes. The advanced oxidation process investigated here is simple, involving only a pump to add hydrogen peroxide and a power supply for the ultraviolet lamps, and the process does not produce any solid residuals. The results of these studies show that a photon‐flux‐driven pseudo‐first‐order model (known as the Prengle–Shimoda rate model) could be used to predict the destruction of total organic carbon, dissolved organic halogen, and dissolved organic halogen precursors.