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Determining Ultratrace Metal Concentrations by Inductively Coupled Plasma Emission Spectrometry
Author(s) -
Malinski Tadeusz,
Fish Judith,
Matusiewicz Henryk
Publication year - 1988
Publication title -
journal ‐ american water works association
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.466
H-Index - 74
eISSN - 1551-8833
pISSN - 0003-150X
DOI - 10.1002/j.1551-8833.1988.tb03012.x
Subject(s) - vaporization , inductively coupled plasma , chemistry , mercury (programming language) , analyte , atomic emission spectroscopy , detection limit , inductively coupled plasma atomic emission spectroscopy , analytical chemistry (journal) , trace metal , metal , inductively coupled plasma mass spectrometry , chromatography , plasma , mass spectrometry , physics , organic chemistry , quantum mechanics , computer science , programming language
The use of electrothermal vaporization devices (ETV) to introduce analytes into inductively coupled plasma (ICP) for determination by atomic emission spectroscopy (AES) provides detection limits in picograms but requires solution concentrations higher than nanogram‐per‐litre levels. Determination of metal concentrations lower than nanograms per litre requires a preconcentration step. The method of controlled potential electrodeposition of metals into mercury film on glassy carbon electrodes for ETV‐ICP‐AES is described. The method can be used for simultaneous multielemental determination of trace and ultratrace concentrations of metals in water. Modification and optimization of the technique are discussed. Also included are the results of determinations of eight trace elements.