Premium
Production of High‐Resistivity Water at Texas Instruments
Author(s) -
Rees Edward C.,
Halff Albert H.,
Reid Allen F.,
McCormack Austin F.
Publication year - 1964
Publication title -
journal ‐ american water works association
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.466
H-Index - 74
eISSN - 1551-8833
pISSN - 0003-150X
DOI - 10.1002/j.1551-8833.1964.tb01213.x
Subject(s) - piping , electrical resistivity and conductivity , polishing , impurity , environmental science , materials science , environmental engineering , chemistry , engineering , composite material , electrical engineering , organic chemistry
The effective operation of semi‐conductor electronic devices depends to a large extent upon the use of a water with unprecedentedly low levels of impurities. Present methods of water analysis are not adequate to determine rapidly the composition and relative proportions of all impurities in water when present in concentrations lower than 1 ppm. Ion Exchange was selected as the study method for obtaining higher resistivity by tandem passage through suitable resins. This study used a single plant rather than several installations located close to the point of use, because the centralized point provided ease of control and operation. As a result, the finished water was distributed throughout a 10‐acre building through suitable piping and was treated in polishing demineralizer beds at each point of use immediately prior to use. The study summarizes the values obtained for various water quality characteristics in the plant.