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DIFFUSION RESISTANCE IN LEAVES AS RELATED TO THEIR STOMATAL ANATOMY AND MICRO‐STRUCTURE
Author(s) -
Lee Richard,
Gates David M.
Publication year - 1964
Publication title -
american journal of botany
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.218
H-Index - 151
eISSN - 1537-2197
pISSN - 0002-9122
DOI - 10.1002/j.1537-2197.1964.tb06725.x
Subject(s) - transpiration , diffusion , biology , limiting , botany , transpiration stream , pressure gradient , medicago sativa , vapor pressure , thermodynamics , mechanics , photosynthesis , physics , mechanical engineering , engineering
Transpiration from a plant leaf depends upon the water vapor pressure gradient between the substomatal cavity and the free air beyond the leaf. Transpiration also depends inversely on the resistance of the diffusion pathway through the substomatal cavity, stomate, and surface boundary layer. The value of the diffusion resistance is derived mathematically for Zebrina pendula, Medicago sativa, and Pinus resinosa. The vapor pressure gradient depends on the leaf temperature and therefore is related to the energy budget of the leaf. The exact solution of the diffusion equation is described and limiting examples discussed. The so‐called “diameter law” is a special case which is distinctly limited in its application.