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Growth and Adhesion Enhancement of Diamond Films Deposited on Steel Substrates by a Cr–N Interlayer
Author(s) -
Glozman Olga,
Hoffman Alon
Publication year - 1998
Publication title -
israel journal of chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.908
H-Index - 54
eISSN - 1869-5868
pISSN - 0021-2148
DOI - 10.1002/ijch.199800008
Subject(s) - diamond , chemical vapor deposition , adhesion , substrate (aquarium) , chemistry , nucleation , layer (electronics) , carbon fibers , chemical engineering , carbon film , metallurgy , composite material , thin film , nanotechnology , materials science , oceanography , organic chemistry , geology , composite number , engineering
Diamond film deposition onto iron‐based substrates by chemical vapor deposition methods is complicated by the formation of black carbon or graphitic soot on the substrate surface prior to diamond nucleation and growth, by fast diffusion of carbon into the iron substrate, and by poor adhesion of the deposited film. These complications suggested the use of a buffer layer between the deposited diamond film and the iron‐based substrate. We review different methods used to improve the adhesion of diamond film to steel substrates. In particular we describe in detail our own studies which involve the use of a Cr‐N interlayer. The use of a chromium nitride interlayer has been found to improve significantly the adhesion of diamond films deposited on ferrous substrates. This is achieved by hindering diffusion processes of carbon and iron, very stable mechanical and chemical bonding between the interlayer and the diamond film, and good adhesion of the interlayer to the steel substrate. We also report on our studies related to residual stress present in the films, as well as a correlation between the interlayer properties and adhesion strength of deposited films.