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Photochemistry of 2‐(Trifluoromethyl) cyclohexanone
Author(s) -
Semisch Christoph,
Margaretha Paul
Publication year - 1984
Publication title -
helvetica chimica acta
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.74
H-Index - 82
eISSN - 1522-2675
pISSN - 0018-019X
DOI - 10.1002/hlca.19840670305
Subject(s) - chemistry , cyclohexanone , trifluoromethyl , cyclohexane , oxetane , ketone , photochemistry , benzene , medicinal chemistry , acetone , alcohol , cleavage (geology) , organic chemistry , alkyl , catalysis , geotechnical engineering , fracture (geology) , engineering
The photochemical behaviour of the title compound 1a is compared to that of the non‐fluorinated parent ketone 2‐methylcyclohexanone ( 1b ). Substitution of the CH 3 ‐ group on C(2) by a trifluoromethyl group strongly enhances 2H ‐ and RH ‐ reduction product formation in cyclohexane or 2‐propanol and oxetane formation in the presence of 2‐methylpropene as olefinic component. Under all these conditions 1b exclusively undergoes a ‐cleavage, a process observed for 1a only in non‐reducing solvents as benzene or tert ‐butyl alcohol.