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The modeling of realistic chemical vapor infiltration/deposition reactors
Author(s) -
Ibrahim John,
Paolucci Samuel
Publication year - 2009
Publication title -
international journal for numerical methods in fluids
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 112
eISSN - 1097-0363
pISSN - 0271-2091
DOI - 10.1002/fld.2155
Subject(s) - chemical vapor infiltration , chemical vapor deposition , mechanics , mach number , chemical reaction , chemical equation , materials science , algebraic number , chemistry , mathematics , physics , mathematical analysis , nanotechnology , composite material , porosity , biochemistry
We describe the low Mach number equations as well as a second‐order numerical integration procedure that are used to solve a realistic chemical vapor infiltration/chemical vapor deposition (CVI/CVD) problem. The simulation accounts for a homogeneous gas chemical reaction mechanism, a heterogeneous surface reaction mechanism, and an evolving pore structure model. The numerical solution of the model ultimately leads to the solution of a large system of stiff differential algebraic equations that are to be integrated over a long time. An operator splitting algorithm is employed to deal with the stiffness associated with chemical reactions, whereas a projection method is employed to overcome the difficulty arising from having to solve a large coupled system for velocity and pressure fields. Results show that the proposed integration procedure is very efficient for modeling long time CVI/CVD densification processes. Copyright © 2009 John Wiley & Sons, Ltd.