Open AccessStable ultrathin surfactant‐free surface‐engineered silicon nanocrystal solar cells deposited at room temperature
Author(s) -
Švrček Vladimir,
McDonald Calum,
Lozac'h Mickael,
Tayagaki Takeshi,
Koganezawa Tomoyuki,
Miyadera Tetsuhiko,
Mariotti Davide,
Matsubara Koji
Publication year - 2017
Publication title -
energy science and engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.638
H-Index - 29
ISSN - 2050-0505
DOI - 10.1002/ese3.165
Subject(s) - materials science , nanocrystal , photoluminescence , nanotechnology , deposition (geology) , thin film , fabrication , optoelectronics , quantum dot , surface roughness , quantum yield , silicon , optics , composite material , medicine , paleontology , alternative medicine , physics , pathology , sediment , fluorescence , biology
We present a scalable technology at room temperature for the fabrication of ultrathin films based on surfactant‐free surface‐engineered silicon nanocrystals (Si NC s). Environmentally friendly pulsed fsec laser induced surface engineering of Si NC s and vacuum low‐angle spray deposition is used to produce ultrathin films. Surface engineering of Si NC s improved stability and dispersibility of Si NC s by allowing thin (30 nm thickness) and exceptionally smooth (mean square roughness corresponds to 0.32 nm) film deposition at room temperature. The quality of the Si NC thin films is confirmed by ultrafast photoluminescence measurements and by applying such films for solar cells. We demonstrate that films produced with this approach yield good and stable devices. The methodology developed here is highly relevant for a very wide range of applications where the formation of high‐quality ultrathin films of quantum dots with controllable thickness and smoothness is required.