Open AccessAl 2 O 3 /TiO 2 double layer anti‐reflection coating film for crystalline silicon solar cells formed by spray pyrolysis
Author(s) -
Kanda Hiroyuki,
Uzum Abdullah,
Harano Norihisa,
Yoshinaga Seiya,
Ishikawa Yasuaki,
Uraoka Yukiharu,
Fukui Hidehito,
Harada Tomitaro,
Ito Seigo
Publication year - 2016
Publication title -
energy science and engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.638
H-Index - 29
ISSN - 2050-0505
DOI - 10.1002/ese3.123
Subject(s) - materials science , photocurrent , silicon , monocrystalline silicon , fourier transform infrared spectroscopy , scanning electron microscope , layer (electronics) , spray pyrolysis , thin film , analytical chemistry (journal) , crystalline silicon , optics , optoelectronics , nanotechnology , composite material , chemistry , organic chemistry , physics
An Al 2 O 3 /TiO 2 double layer anti‐reflection coating ( ARC ) film formed by spray pyrolysis was introduced for monocrystalline silicon solar cells as the nonvacuum processing method. The thickness of the Al 2 O 3 layer and TiO 2 compact layer was controlled by the volume of deposited precursor solution and confirmed by ellipsometry and scanning electron microscopy. The average photovoltaic properties of photocurrent density ( J sc ), open‐circuit photovoltage ( V oc ), fill factor ( FF ), and photo energy conversion efficiency ( η ) were 37.0 mA /cm 2 , 590 mV , 0.712, and 15.5%, respectively. A significant improvement on J sc and η could be confirmed owing to the Al 2 O 3 /TiO 2 ARC . The results of Fourier transform infrared ( FTIR ) spectroscopy and optical simulation with modeling for the reflectance properties confirmed that C‐H‐based organics remained after the deposition of thin films.