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Interface Engineering for High‐Performance Photoelectrochemical Cells via Atomic Layer Deposition Technique
Author(s) -
Cao Shiyao,
Zhang Zheng,
Liao Qingliang,
Kang Zhuo,
Zhang Yue
Publication year - 2021
Publication title -
energy technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.91
H-Index - 44
eISSN - 2194-4296
pISSN - 2194-4288
DOI - 10.1002/ente.202170023
Subject(s) - atomic layer deposition , interface (matter) , surface engineering , deposition (geology) , nanotechnology , materials science , layer (electronics) , optoelectronics , composite material , geology , paleontology , capillary number , sediment , capillary action
A short overview of atomic layer deposition (ALD) application in the interface engineering of photoelectrochemical (PEC) cells is given. The results of ALD technology‐based interface and surface engineering for high‐performance PEC cells in recent years are summarized and the challenges and opportunities of the development of ALD‐based interface engineering for high‐performance PEC cells in the near future are discussed. More details can be found in article number 2000819 by Zhuo Kang, Yue Zhang, and co‐workers.