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On the Integration of Dielectrometry into Electrochemical Impedance Spectroscopy to Obtain Characteristic Properties of a Dielectric Thin Film
Author(s) -
Sapotta Benedikt,
Schwotzer Matthias,
Wöll Christof,
Franzreb Matthias
Publication year - 2022
Publication title -
electroanalysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.574
H-Index - 128
eISSN - 1521-4109
pISSN - 1040-0397
DOI - 10.1002/elan.202100484
Subject(s) - dielectric spectroscopy , nanoporous , materials science , dielectric , electrode , thin film , electrical impedance , permittivity , compensation (psychology) , analytical chemistry (journal) , dielectric permittivity , electrochemistry , optoelectronics , nanotechnology , chemistry , electrical engineering , chromatography , psychology , engineering , psychoanalysis
We demonstrate a novel impedimetric approach providing unprecedented insight into characteristic properties of dielectric thin films covering electrode surfaces. The concept is based on the joint interpretation of electrochemical impedance spectroscopy (EIS) together with dielectrometry (DEM) whose informative value is mutually interconnected. The advantage lies in the synergistic compensation of individual shortcomings adversely affecting conventional impedimetric analysis strategies relying exclusively on either DEM or the traditional EIS approach, which in turn allows a reliable determination of thickness and permittivity values. The versatility of the method proposed is showcased by an in‐situ growth‐monitoring of a nanoporous, crystalline thin film (HKUST‐1) on an interdigitated electrode geometry.