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Effect of Anionic Electrolytes and Precursor Concentrations on the Electrodeposited Pt Structures
Author(s) -
Kim Dajeong,
Kim Jongwon
Publication year - 2017
Publication title -
electroanalysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.574
H-Index - 128
eISSN - 1521-4109
pISSN - 1040-0397
DOI - 10.1002/elan.201600346
Subject(s) - monolayer , electrochemistry , underpotential deposition , electrolyte , adsorption , materials science , deposition (geology) , platinum , inorganic chemistry , chemical engineering , cyclic voltammetry , chemistry , nanotechnology , electrode , catalysis , organic chemistry , paleontology , sediment , engineering , biology
Electrodeposition of functional metal surfaces has received great attention because of their useful applications. Recently, interesting electrodeposition behavior of Pt at −0.8 V (vs. Ag/AgCl) was reported, where underpotential deposited H (H upd ) layers played a unique role in the electrodeposition. Here, we report the effect of anionic electrolytes and precursor concentrations on the electrochemical deposition behavior of Pt. Depending on these two experimental parameters, two distinct Pt structures, monolayer Pt films and Pt spheres, were electrodeposited at −0.8 V. In addition to the underpotential deposited H (H upd ) layers formed at −0.8 V, the adsorption of Cl − also plays a significant role in determining the electrodeposited Pt structures. When the PtCl 4 2− concentration was low and the Cl − concentration was high enough for the adsorption of PtCl 4 2− to be blocked by the H upd and Cl − layers, monolayer Pt films were electrodeposited. Otherwise, further electrodeposition of Pt spheres over the monolayer Pt films occurred. The effect of other halide ion adsorption and the controlled growth of Pt spheres during the Pt electrodeposition were also investigated. The electrochemical deposition behavior of Pt demonstrated in this work provides insight into the fabrication of functional Pt surfaces.