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Mesoporous Silica Sputter‐Coated onto ITO: Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores
Author(s) -
Vuorema Anne,
Sillanpää Mika,
Edler Karen J.,
Jaber Robben,
Dale Sara E. C.,
Bending Simon,
Gu Yunfeng,
Yunus Kamran,
Fisher Adrian C.,
Marken Frank
Publication year - 2012
Publication title -
electroanalysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.574
H-Index - 128
eISSN - 1521-4109
pISSN - 1040-0397
DOI - 10.1002/elan.201200141
Subject(s) - nanopore , materials science , mesoporous material , electrochemistry , chemical engineering , mesoporous silica , electrolyte , aqueous solution , adsorption , membrane , sputtering , inorganic chemistry , nanotechnology , thin film , chemistry , electrode , organic chemistry , biochemistry , engineering , catalysis
“Simple” silica films of 50 nm and 100 nm thickness are sputter‐coated onto ITO substrates and shown to be structured with in‐planed features of ca. 15 nm and pores <5 nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN) 6 4− in aqueous KNO 3 strongly depends on the electrolyte concentration. Poly‐cationic poly(diallyl‐dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of “discs”. Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements.