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Front Cover: In Situ Investigation of the Thermal Decomposition of Cl 4 (CH 3 CN)W(N i Pr) During Simulated Chemical Vapor Deposition (Eur. J. Inorg. Chem. 32/2019)
Author(s) -
Nolan Michelle M.,
Kim Seo Young,
Koley Arijit,
Anderson Tim,
McElweeWhite Lisa
Publication year - 2019
Publication title -
european journal of inorganic chemistry
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.667
H-Index - 136
eISSN - 1099-0682
pISSN - 1434-1948
DOI - 10.1002/ejic.201900862
Subject(s) - chemical vapor deposition , chemistry , front cover , raman spectroscopy , decomposition , thermal decomposition , tungsten , in situ , characterization (materials science) , chemical decomposition , analytical chemistry (journal) , cover (algebra) , chemical engineering , nanotechnology , organic chemistry , materials science , optics , mechanical engineering , physics , engineering
The Front Cover shows a look inside CVD. Most characterization of chemical vapor deposition (CVD) precursors occurs under conditions different from those inside CVD reactors. This work used in situ Raman spectroscopy during simulated CVD to examine the gas phase decomposition of a known WN x C y precursor. In combination with previous ex situ and computational studies, we now propose a decomposition mechanism for the tungsten imido complex Cl 4 (CH 3 CN)WN i Pr during CVD. This project was initiated with support from the National Science Foundation under grant CHE‐0911640. More information can be found in the Communication by L. McElwee‐White et al. For more on the story behind the cover research, see the Cover Profile.