z-logo
Premium
Synthesis of a Family of ([SnSe] 1+ δ ) m ([{Mo x Nb 1 x }Se 2 ] 1+ γ ) 1 ([SnSe] 1+ δ ) m ({Nb x Mo 1– x }Se 2 ) 1 Superlattice Heterostructures ( m = 0, 1, 2, 3, 4 and 0.8 ≤ x ≤ 1)
Author(s) -
Westover Richard D.,
Mitchson Gavin,
Ditto Jeffrey J.,
Johnson David C.
Publication year - 2016
Publication title -
european journal of inorganic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.667
H-Index - 136
eISSN - 1099-0682
pISSN - 1434-1948
DOI - 10.1002/ejic.201501324
Subject(s) - chemistry , heterojunction , amorphous solid , electrical resistivity and conductivity , crystallography , diffusion , conductivity , layer (electronics) , metal , hall effect , nanometre , analytical chemistry (journal) , chemical engineering , materials science , optoelectronics , organic chemistry , electrical engineering , engineering , physics , chromatography , thermodynamics
A family of multiple‐component heterostructures, ([SnSe] 1+ δ ) m ([{Mo x Nb 1– x }Se 2 ] 1+ γ ) 1 ([SnSe] 1+ δ ) m ({Nb x Mo 1– x }Se 2 ) 1 ( m = 0, 1, 2, 3, 4 and 0.8 ≤ x ≤ 1), was self‐assembled from designed amorphous precursors, and their structure and physical properties were characterized. The compounds consist of MoSe 2 and NbSe 2 layers with metal centers in a trigonal‐prismatic environment interleaved with systematically increasing numbers of SnSe bilayers with a distorted rock salt structure. The extent of alloying of the miscible dichalcogenide constituents decreased from about 20 % for m = 0 to less than 1 % for m = 3 and 4. The decreased alloying with increased SnSe thickness suggests the diffusion lengths of Mo and Nb during self‐assembly are about a nanometer. Resistivity and Hall coefficient measurements show that the electrical transport properties are similar to those of ([SnSe] 1+ δ ) m (NbSe 2 ) 1 ( m = 1–8) compounds, suggesting that the NbSe 2 layer dominates the conductivity and that charge transfer from SnSe reduces the carrier concentration in the NbSe 2 layer.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom