Premium
Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth? (Eur. J. Inorg. Chem. 6/2014)
Author(s) -
Sundberg Pia,
Karppinen Maarit
Publication year - 2014
Publication title -
european journal of inorganic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.667
H-Index - 136
eISSN - 1099-0682
pISSN - 1434-1948
DOI - 10.1002/ejic.201490026
Subject(s) - atomic layer deposition , chemistry , cover (algebra) , deposition (geology) , layer (electronics) , thin film , nanotechnology , chemical engineering , organic chemistry , materials science , mechanical engineering , paleontology , sediment , engineering , biology
The cover picture shows the deposition cycle of a (Ti–O–C 6 H 4 –N=) n ‐type thin film with TiCl4 and 4‐aminophenol as precursors. The atomic/molecular layer‐by‐layer growth process is carried out by employing a combination of the atomic and molecular layer deposition (ALD/MLD) techniques. The combined ALD/MLD technique provides a powerful tool to fabricate organic–inorganic hybrid thin films with versatile structures. Details are discussed in the article by P. Sundberg and M. Karppinen on p. 968 ff . For more on the story behind the cover research, see the Cover Profile .