Organic–Inorganic Thin Films from TiCl 4  and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth? (Eur. J. Inorg. Chem. 6/2014) | Zendy

Sundberg Pia | Zendy; Karppinen Maarit | Zendy

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Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth? (Eur. J. Inorg. Chem. 6/2014)

Author(s) -

Sundberg Pia,

Karppinen Maarit

Publication year - 2014

Publication title -

european journal of inorganic chemistry

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.667

H-Index - 136

eISSN - 1099-0682

pISSN - 1434-1948

DOI - 10.1002/ejic.201490026

Subject(s) - atomic layer deposition , chemistry , cover (algebra) , deposition (geology) , layer (electronics) , thin film , nanotechnology , chemical engineering , organic chemistry , materials science , mechanical engineering , paleontology , sediment , engineering , biology

The cover picture shows the deposition cycle of a (Ti–O–C 6 H 4 –N=) n ‐type thin film with TiCl4 and 4‐aminophenol as precursors. The atomic/molecular layer‐by‐layer growth process is carried out by employing a combination of the atomic and molecular layer deposition (ALD/MLD) techniques. The combined ALD/MLD technique provides a powerful tool to fabricate organic–inorganic hybrid thin films with versatile structures. Details are discussed in the article by P. Sundberg and M. Karppinen on p. 968 ff . For more on the story behind the cover research, see the Cover Profile .

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