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Preparation of Porous Silicon by Sodiothermic Reduction of Zeolite and Photoactivation for Benzene Oxidation
Author(s) -
Wang JingFeng,
Chen JieSheng,
Zhou ZhongFu
Publication year - 2015
Publication title -
european journal of inorganic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.667
H-Index - 136
eISSN - 1099-0682
pISSN - 1434-1948
DOI - 10.1002/ejic.201403033
Subject(s) - porous silicon , chemistry , benzene , silicon , zeolite , phenol , photochemistry , porosity , molecule , photocatalysis , yield (engineering) , irradiation , inorganic chemistry , chemical engineering , catalysis , organic chemistry , materials science , physics , nuclear physics , engineering , metallurgy
Porous silicon with its high specific surface, prepared by a sodiothermic reduction method using zeolite ZSM‐5 as the silicon precursor, has been used as an efficient photoactivator for direct oxidation of benzene to yield phenol in H 2 O 2 solution under visible light irradiation. The surface oxidation of the porous silicon together with electron transition under the visible light irradiation acts on the benzene molecules, resulting in the generation of phenol molecules. By acid treatment the photoactivity of the used porous silicon is regained.