Organic–Inorganic Thin Films from TiCl 4  and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth? | Zendy

Sundberg Pia | Zendy; Karppinen Maarit | Zendy

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Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth?

Author(s) -

Sundberg Pia,

Karppinen Maarit

Publication year - 2014

Publication title -

european journal of inorganic chemistry

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.667

H-Index - 136

eISSN - 1099-0682

pISSN - 1434-1948

DOI - 10.1002/ejic.201400081

Subject(s) - atomic layer deposition , chemistry , thin film , deposition (geology) , cover (algebra) , layer (electronics) , inorganic chemistry , chemical engineering , nanotechnology , organic chemistry , materials science , mechanical engineering , paleontology , sediment , engineering , biology

Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti–O–C 6 H 4 –N=) n ‐type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl 4 and 4‐aminophenol as precursors.

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