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Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth?
Author(s) -
Sundberg Pia,
Karppinen Maarit
Publication year - 2014
Publication title -
european journal of inorganic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.667
H-Index - 136
eISSN - 1099-0682
pISSN - 1434-1948
DOI - 10.1002/ejic.201400081
Subject(s) - atomic layer deposition , chemistry , thin film , deposition (geology) , cover (algebra) , layer (electronics) , inorganic chemistry , chemical engineering , nanotechnology , organic chemistry , materials science , mechanical engineering , paleontology , sediment , engineering , biology
Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti–O–C 6 H 4 –N=) n ‐type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl 4 and 4‐aminophenol as precursors.