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Atomic Layer Deposition of Titanium and Vanadium Oxide on Mesoporous Silica and Phenol/Formaldehyde Resins – the Effect of the Support on the Liquid Phase Epoxidation of Cyclohexene
Author(s) -
Muylaert Ilke,
Musschoot Jan,
Leus Karen,
Dendooven Jolien,
Detavernier Christophe,
Van Der Voort Pascal
Publication year - 2012
Publication title -
european journal of inorganic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.667
H-Index - 136
eISSN - 1099-0682
pISSN - 1434-1948
DOI - 10.1002/ejic.201101000
Subject(s) - chemistry , catalysis , cyclohexene , vanadium , titanium , inorganic chemistry , oxide , vanadium oxide , formaldehyde , mesoporous silica , metal , mesoporous material , chemical engineering , phenol , layer (electronics) , organic chemistry , engineering
Abstract Titanium and vanadium oxide layers have been grown in the pores of two 2D hexagonal ordered mesoporous materials: SBA‐15 (silica) and FDU‐15 (phenol/formaldehyde resin). The deposition of the layers was controlled by the self‐limiting reaction of the metal oxide precursor with the hydroxyl surface. Single, multiple and mixed titanium and vanadium oxide layers have been synthesised, and the influence of the layer type on the catalytic performance in the liquid phase epoxidation of cyclohexene has been evaluated. The effect of the support on the catalytic behaviour is discussed, and a reaction mechanism is proposed. The support–oxygen–metal bond is assumed to be critical for catalytic epoxidation.