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Stable Trichlorosilane–Pyridine Adducts
Author(s) -
Fester Gerrit W.,
Wagler Jörg,
Brendler Erica,
Kroke Edwin
Publication year - 2008
Publication title -
european journal of inorganic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.667
H-Index - 136
eISSN - 1099-0682
pISSN - 1434-1948
DOI - 10.1002/ejic.200800844
Subject(s) - chemistry , trichlorosilane , adduct , pyridine , octahedron , yield (engineering) , crystal structure , crystallography , medicinal chemistry , stereochemistry , organic chemistry , silicon , materials science , metallurgy
The prepapration, and first comprehensive spectroscopic and structural characterization of octahedral trichlorosilane adducts HSiCl 3 (Rpy) 2 with R = H, 4‐CH 3 , 4‐C 6 H 5 , 3‐Br, 4‐CHCH 2 , 4‐C 2 H 5 , 4‐C(CH 3 ) 3 and 4‐N(CH 3 ) 2 is reported. The products are surprisingly stable in the solid state and easily obtained in high yield. Single‐crystal X‐ray diffraction analysis of HSiCl 3 (3‐Brpy) 2 revealed relatively short Si–Cl bonds (218–223 pm) while the Si–N bonds (ca. 198 pm) are only slightly longer than in the corresponding H 2 SiCl 2 (Rpy) 2 adducts. Dismutation reactions were observed only in polar solvents at elevated temperatures.(© Wiley‐VCH Verlag GmbH & Co. KGaA, 69451 Weinheim, Germany, 2008)