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Tungsten Oxide and Tungsten Oxide‐Titania Thin Films Prepared by Aerosol‐Assisted Deposition – Use of Preformed Solid Nanoparticles
Author(s) -
Qureshi Uzma,
Blackman Christopher,
Hyett Geoffrey,
Parkin Ivan P.
Publication year - 2007
Publication title -
european journal of inorganic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.667
H-Index - 136
eISSN - 1099-0682
pISSN - 1434-1948
DOI - 10.1002/ejic.200601211
Subject(s) - nanoparticle , tungsten , chemistry , superhydrophilicity , chemical engineering , chemical vapor deposition , evaporation , microstructure , oxide , aerosol , deposition (geology) , thin film , nanotechnology , materials science , contact angle , organic chemistry , crystallography , paleontology , physics , sediment , biology , engineering , thermodynamics
Aerosol‐assisted deposition (AAD) was used to deposit films of WO 3 from a suspension of solid nanoparticulate WO 3 in toluene. Titania films were deposited by the aerosol‐assisted chemical vapour deposition of [Ti(O i Pr) 4 ] in the presence of WO 3 nanoparticles. The WO 3 and TiO 2 films exhibited photoactivity and photoinduced superhydrophilicity, further the titania films showed very unusual highly crenulated microstructures. These microstructures could not be obtained by sol‐gel, atmospheric pressure chemical vapour deposition or evaporation routes. Furthermore, the microstructures could not be obtained from [Ti(O i Pr) 4 ] in the absence of nanoparticulate WO 3 . (© Wiley‐VCH Verlag GmbH & Co. KGaA, 69451 Weinheim, Germany, 2007)