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Cover Picture: Plasma‐Enhanced CVD Synthesis and Structural Characterization of Ta 2 N 3 (Eur. J. Inorg. Chem. 16/2004)
Author(s) -
Ganin Alexei Yu.,
Kienle Lorenz,
Vajenine Grigori V.
Publication year - 2004
Publication title -
european journal of inorganic chemistry
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.667
H-Index - 136
eISSN - 1099-0682
pISSN - 1434-1948
DOI - 10.1002/ejic.200490032
Subject(s) - chemistry , tantalum , cover (algebra) , plasma , nitride , nitrogen , characterization (materials science) , molecule , tantalum nitride , nanotechnology , crystallography , inorganic chemistry , organic chemistry , mechanical engineering , physics , nuclear physics , materials science , layer (electronics) , engineering
The cover picture shows symbolically the activation of an N 2 molecule by igniting a plasma discharge in nitrogen gas. The crystal structure of a new tantalum nitride obtained by the plasma‐enhanced CVD method is seen in the background. Details are discussed in the article by G. V. Vajenine et al. on p. 3233 ff. We thank the Alexander von Humboldt Foundation for support through a Sofia Kovalevskaja Research Award.